Sicozone clean is a versatile solution widely used in chip manufacturing. It serves various purposes, including cleaning organics and metals, as well as performing oxide etches. Applications range from pre-implantation to furnace processses by addressing gate oxides, tunnel oxides, and channel oxides. Additionally, it is deployed in advanced packaging for diced wafers. Standard benchmarks include particle counts below 20 @ 0.12µm, contamination levels below 1E10 for metals, and uniformities less than 1%. Furthermore, it boasts minimal chemical and water consumption while delivering high cleaning efficiency.