Resist Strip

The proven benefits of our resist stripping processes include saving on chemicals and process media, enhancing product quality, achieving zero-defect production targets, and increasing operational safety. Learn more about our resist stripping equipment and potential processes with BATCHSPRAY® systems.

Possible processes with our resist strip systems

Implanted photoresist strip

The photoresist is treated by an implantation process beforehand. Several million foreign atoms adhere to the molecular structure of the photoresist. This creates a strong crust that is difficult to remove.

Positive photoresist strip

Positive photoresist forms a horizontally linked structure. Light-exposed areas are removed to pattern the surface. Consequently, it is the easiest type of photoresist to remove

Negative photoresist strip

Negative photoresist forms a stable type of resist due to its vertical and horizontal crosslinked structure. Non-light-exposed areas are removed to pattern the surface.

Photoresist rework

Occasionally, the patterning of photoresist isn’t perfect. Consequently, the photoresist has to be removed and reapplied.

SicOzone strip

The photoresist stripping process uses ozone, promoting sustainability. It combines DI water with ozone gas to remove photoresist effectively. Two steps ensure efficient removal.

Stressed photoresist

This type of photoresist is treated either by a long and hot bake to harden it for critical downstream processes. Due to its treatment, it’s hard to remove.

Autoload Clean vs. conventional system

Resist strip comparison

Increase of throughput
Reduction of chemical consumption
Reduction of waste treatment
Reduction of costs/wafer

Photoresist strip process

Finally, the photoresist is stripped either via SicOzone process or by solvent based medias.

Equipment for resist strip applications

Acid Autoload

Solvent Autoload

Clean Autoload

Acid/Solvent Autoload

Acid/Clean Autoload

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