Applications

Clean

The proven benefits of our cleaning processes include saving on chemicals and process media, enhancing product quality, achieving zero-defect production targets, and increasing operational safety. Learn more about our cleaning equipment and potential processes with BATCHSPRAY® cleaning systems.

Possible processes with BATCHSPRAY® cleaning systems

► Prediffusion Cleans
► Gate Oxide Clean
► Tunnel Oxide Clean
► Contact Cleans
► Organic & Metal Clean
► Native Oxide Removal
► SicOzone Clean
► Post Ash Residue Clean
► Etch Residue Clean
► HF Last
► Post Etch Residue Clean
► Polymer Clean
► Photomask Clean
► DSP Diluted Sulfuric Peroxide
Cleaning process for Front-End-of-Line (FEOL)

To cover DHF

To remove or thin any kind of oxide in the FEOL a DHF step is performed. With Inline spiking technology DHF ratios from 0.006% to 0.15% are possible (with spiked 49%HF).

Cleaning process for Front-End-of-Line (FEOL)

To cover SC1

The sustainable alternative for organic residue clean from the wafer surface consists of Ammonia, Ozone and DI Water. The DI – ammonia mix vary from 50:1 to 1000:1. That means very small amounts of Ammonia are spiked into the DI water stream. Additional, to the DI Water – Ammonia mix injected from one side of the process chamber, Ozone in  gasform is injected from the other side. With this all its effectivity is enhanced directly on the wafer surface.

Cleaning process for Front-End-of-Line (FEOL)

To cover SC2

Almost like the organic removal the clean of metallic residues works. The mix to clean metallic resiudes from the wafer surface consists of Hydrocloric Acid (HCl), Ozone and DI Water. The DI Water – HCl mix vary from 300:1 to 1000:1. That means very small amount of HCl are spiked into the DI water stream. Additional, to the DI Water – HCl mix injected from one side of the process chamber, Ozone in  gasform is injected from the other side. If no contamination of noble metals is expected Ozone is not needed.

Suitable Equipment

Equipment for cleaning applications

BATCHSPRAY® Acid Autoload

BATCHSPRAY® Solvent Autoload

BATCHSPRAY® Clean Autoload

BATCHSPRAY® Acid/Solvent Autoload

BATCHSPRAY® Acid/Clean Autoload

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