BATCHSPRAY®
Solvent
Autoload

General features

Throughput up to 300 wph

Intelligent wafer handling meets experienced wafer processing.

Fully automated

A robot transfers the wafer batch from loadport into the process chamber.

2 process chambers

Thanks to a clever assembly of process modules, we achieve two process chambers.

Footprint <12 m²

Small process module footprint combined with smart wafer handling.

Processes on SiC/GaN

Processes for SiC and GaN substrates are available.

Chemical recirculation by tank system

Recirculation of the chemical provides a stable temperature and concentration condition.

Optional automation features

Dedicated handlers for dirty in/clean out handling

For enhanced wafer handling efficiency, we offer dedicated handlers specifically designed for dirty in/clean out processes. These specialized handlers ensure optimal cleanliness and prevent cross-contamination, maintaining the highest standards of wafer integrity.

Dedicated handlers for left and right process chamber

To capture your unique process requirements, our equipment includes dedicated handlers for both left and right process chambers. This tailored approach maximizes workflow flexibility, enabling seamless integration into your existing setup for improved productivity and convenience.

Wafer size

Feasible applications

Clean
Resist Strip

Suitable features

DIW Spiking

Green Goals. Yellow Solutions.

Technology is all around us, shaping our daily lives and making them better. Siconnex is redefining progress by merging technology and sustainability, no longer presenting them as opposites. Sustainable technology for the progress of tomorrow. Green Goals. Yellow Solutions.