Exploring the New Trend in Wet Etching: Join Our Expert Webinar for the Japanese Market
The semiconductor industry is entering a new phase of innovation in wet etching processes – driven by the need for higher precision, lower chemical usage, and more flexible manufacturing solutions. As demands grow more complex and sustainability becomes a core focus, industry experts are reevaluating wet etching as a forward-looking alternative to dry etching in several critical applications.
To shed light on this shift, siconnex is hosting a dedicated webinar for the Japanese market, bringing together experts from three unique perspectives: academia, chemical supply, and equipment technology.
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A renowned professor in wet etching will explain the fundamentals of wet etch processes, comparing silicon and compound materials, and outlining how low-concentration chemistries can achieve excellent results while cutting chemical consumption.
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A leading chemical supplier will share how they are developing etchants optimized for low-volume usage, supporting the transition from dry to wet etch methods. These advanced formulations maintain performance while promoting more eco-conscious manufacturing.
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A siconnex representative will introduce our batch spray system technology, which offers efficient, resource-saving process integration. With precise control and flexible configuration, our systems enable significant chemical savings while ensuring consistent, high-quality results across multiple wafers.
This webinar offers a comprehensive view into the “New Trend of Wet Etching”, bridging theory, chemistry, and equipment in one event. Whether you’re looking to optimize your etch process, reduce chemical costs, or explore alternatives to dry etching, this session will offer practical insights and expert guidance.
📅 We invite all semiconductor professionals to join the informative webinar on 16 September 2025 from 15:00 to 17:00 Japanese time.