General Information
- Siconnex SAT
- Sample configuration
The Siconnex spray acid tool (SAT) is an automated dry-to-dry wet batch system for etching processes.
Ozone systems (resist strip) and endpoint-detection systems (automated etching control) can be implemented.
Process Principle
Chemicals are sprayed on the spinning substrates, then the batch is rinsed with demineralized and hot demineralized water and dried with hot nitrogen.
Process Examples
- Metal etch (aluminium, gold/platinum, copper, silicon, tungsten (=wolfram), titanium, titanium nitride, Titanium tungsten, …)
- Oxide etch (silicon dioxide etching)
- Resist strip (post ash)
- Wafer reclaim
- Post CMP cleaning (chemical mechanical planarization)
Advantages
- Chemical cabinet
- User interface
- Reliable Hardware
- Siconnex Focus
- Components
- Operator Safety: Automated Dry-to-Dry Process
- Footprint 1m²
- Environmental friendly, less DIW & Exhaust Consumption
- Fast Support
- Fully trained Field Service Engineer
- Software & Service Support
- Spare parts on stock
- Process Knowledge
- Process Development
- Reliable & Uniform
- Process Support
- Customized Process Hardware
- Test-Laboratory