siconnex - Spray Acid and Solvent Tools - SAT SST SRD http://www.siconnex.com/ siconnex offers Semitool semiconductor equipment like spray acid tool SAT and spray solvent tool SST as well as spin rinse dryer SRD. siconnex is your partner for wet batch process, DNS coater and developer as well as single wafer process, puddle or dispense process and spray process. siconnex customized solutions service GmbH siconnex customized solutions service GmbH 2010-03-10T11:20:53 de (c) siconnex customized solutions service GmbH siconnex - Spray Acid and Solvent Tools - SAT SST SRD http://www.siconnex.com/-/siconnex.gif http://www.siconnex.com/ Spray Solvent Tool http://www.siconnex.com/http://www.siconnex.com/index.php?id=95

Process:

  • Automated
  • Dry to Dry
  • Batch Spray System

Main Applications

  • Positive Resist Strip
  • Polymere Removal
  • Negative Resist Strip
  • Batch Develop

Advantages

  • Operator Safety
  • Closed automated System
  • Fresh and Used Process Chemicals

Process Example

  • (1)   Load Wafer
  • (2a) Strip (Solvent used)
  • (2b) Strip (Solvent fresh)
  • (3a) Clean (IPA used)
  • (3b) Clean (IPA fresh)
  • (4)   DIW Rinse
  • (5)   Dry Wafer
]]> Spray Solvent Tool 2010-01-08T09:36:35 Spray Acid Tool http://www.siconnex.com/http://www.siconnex.com/index.php?id=40

  • Automated
  • Dry to Dry
  • Batch Spray System

Main Applications

  • Metal Etch
  • Oxide Etch
  • Ti-Etch
  • Tungsten Etch
  • PDC (DHF, SC1, SC2)
  • Resist Strip
  • Freckle Etch

Process Example

  • (1) Load Wafer
  • (2) Al-Etch
  • (3) DIW Rinse
  • (4) Freckle Etch
  • (5) DIW Rinse
  • (6) Resist Strip
  • (7) DIW Rinse
  • (8) Dry Wafer

Advantages

  • Operator Safety
  • Closed automated System
  • Uniformities <3%
  • DIW Savings
  • End Point Detection
]]> Spray Acid Tool 2010-01-08T09:28:10 Applications http://www.siconnex.com/http://www.siconnex.com/index.php?id=105

Etch

  • Al-Etch with End Point Detection
  • Cu-Etch with End Point Detection
  • Oxide Etch

Lift Off

  • Metal Lift Off (Gold or Aluminium)

Cleaning

  • Selective Side Clean

Resist Strip

  • with SicOzone Strip (O3)
  • with Acids
  • with Solvents

Scrubber

  • JetSpray
  • AtomizedSpray
  • MegaSonic
  • with NH4OH or HF

Lithography

  • Resist Coating
  • Resist Developing
  • Inline

Watch Euipment Video

Link to Batch Spray Applications

Link to Process Laboratory

]]> Applications 2010-01-08T08:51:03 Applications http://www.siconnex.com/http://www.siconnex.com/index.php?id=104

Process Principle

  • Dry to Dry
  • Automated
  • Batch Spray

Advantages

  • Operator Safety
  • Equipment with Small Footprint
  • Low DI Water Consumption

Etch

  • Metal Etch (Al, Pt, Ti, TiW, Au, Cu,....)
  • Oxide Etch
  • Si-Etch
  • Freckle Etch

Cleaning

  • Polymere removal (Acid)
  • Pre Diffusion Clean (DHF, SC1, SC2)
  • Wafer Reclaim
  • Post CMP Clean
  • Monitor Wafer Clean
  • Polymere removal (Solvent)

Resist Strip (Acids, O3)

  • Positive Resist
  • Negative Resist
  • Strip with O3 (Ozone)

Resist Strip (Solvents)

  • Positive Resist
  • Negative Resist

Develop

  • Batch Delevop

Process Example

  • Load Wafer
  • Step 1: Metal Etch
  • Step 2: Di Water Rinse
  • Step 3: Freckle Etch
  • Step 4: Di Water Rinse
  • Step 5: Resist Strip
  • Step 6: Di Water Rinse
  • Step 7: Dry Wafer
  • more

CD Uniformities

  • Batch < 3%
  • Wafer < 3%


Link to Single Wafer Applications

]]> Applications 2009-03-30T11:15:53 Technical Information http://www.siconnex.com/http://www.siconnex.com/index.php?id=107

Software

  • Secs II Gem
  • Acces for 3 Levels (Service, Process, Operator)
  • Siemens Controller
  • Siemens Color Touchscreen
  • 99 Recipes
  • Resistivity Measurement

Wafer Handling & Process

  • Substrate Sizes 1" to 8"
  • RPM up to 2500
  • DI Water Resistivity Sensor
  • N2 Filter POU

User Interface

Safety
  • Fire resistant Cover (Takiron, FRPP), according FM4910
  • CE Certification
  • Mechanical Door Lock
  • Emergency Power Off Box (EPO)

Hardware Standards

  • DI Water Manifold Gasket
  • DI-W Recirculation
  • Rear Bowl Seal
  • N2 Manifold
  • N2 Pressure Sensors
  • N2 cartridge heater
  • Front panel indicator lights
  • Teflon valve assembly
  • Cartridge Ferro fluid Seal
  • High flow, low pressure nozzles
  • Bowl blanket heater w/ OT thermal switch
  • Bowl blankets with OT and AT temp thermal switch
  • Teflon drain tube
  • Teflon supply lines (3/8” OD)
  • Colour coded tubing
  • Nylon barbed pneumatic fittings
  • Chemical resistant Start/Stop switches
  • Vibration dampeners
  • Electropolished Bowl
  • Brushless Motor
  • Rotor Stop Positioner (RSP)
]]> Technical Information 2008-10-03T11:14:15 Technical Information http://www.siconnex.com/http://www.siconnex.com/index.php?id=106
Chemical Layout
]]> Technical Information 2008-10-03T10:47:15 Spare Parts & Services http://www.siconnex.com/http://www.siconnex.com/index.php?id=60&no_cache=1

Siconnex

  • Spray Acid Tool (SAT)
  • Spin Rinse Dryer (SRD)
  • Spray Solvent Tool (SST)
  • Single Wafer (VERTICAL)

DNS

  • Spin Motor
  • Heat Exchanger
  • Lamphouse
  • EEW Lamps
  • Servo Amplifier
  • Spin Unit Parts
  • Pumps

Semitool

  • Touchscreens
  • Boards
  • Heater
  • Seal & Window
  • Motor Controller
  • Actuator
  • Rotor Stop Positioner
  • Anti Static Cell
  • Cartridge Ferrofluid
  • Flowmeter
  • Pumps & Accessory
  • Miscellaneous

Short Lead Time

  • Warehouse Depot for Spare Parts & Consumables in Europe and in Asia
  • Worldwide Delivery

24h Express delivery

  • Express Delivery for parts from our Warehouse within 24h

Warranty

  • All parts are tested, qualified and come with Warranty

OEM Numbers

  • We handle OEM numbers
  • Online Database for parts search www.siconnex.com

Contact

  • office@siconnex.com
  • Phone: +43 6229 36646-0
  • Fax: +43 6229 36646-146
]]> Overview 2008-10-03T10:39:04 Rotor & Inserts http://www.siconnex.com/http://www.siconnex.com/index.php?id=109
Change Substrate Size within seconds

Solution 1: Rotor for 8", Insert for 6"
Solution 2: Insert for 8", 6", 5"
]]> Rotor & Inserts 2008-10-03T09:00:38 Rotor & Inserts http://www.siconnex.com/http://www.siconnex.com/index.php?id=97
Change Substrate Size within seconds

Solution 1: Rotor for 8", Insert for 6"
Solution 2: Insert for 8", 6", 5"
]]> Rotor & Inserts 2008-10-03T08:59:32 Process Example http://www.siconnex.com/http://www.siconnex.com/index.php?id=94

Process Example

  • (1) Load Wafer
  • (2) 2:30 min Al-Etch
  • (3) 1:30 min DIW Rinse
  • (4) 1:30 min Freckle Etch
  • (5) 1:30 min DIW Rinse
  • (6) 9:00 min Resist Strip
  • (7) 6:00 min DIW Rinse
  • (8) 9:00 min Dry Wafer
Total: 31 min
~ 98wafer/h Dry to Dry

APPLICATIONS

Cleaning

  • Polymere removal
  • Pre Diffusion Clean (DHF, SC1, SC2)
  • Wafer Reclaim
  • Post CMP Clean
  • Monitor Wafer Clean

Etch

  • Metal Etch (Al, Pt, Ti, TiW, Au, Cu,....)
  • Oxide Etch
  • Si-Etch
  • Freckle Etch

Resist Strip

  • Positive Resist
  • Negative Resist
  • Strip with O3 (Ozone)
]]> Process Example 2008-10-03T08:32:04 Technical Information http://www.siconnex.com/http://www.siconnex.com/index.php?id=92
Chemical Layout

Chamber

Teflon Rotor 25/50 Wafer
]]> Technical Information 2008-10-01T16:58:58 Spin Rinse Dryer http://www.siconnex.com/http://www.siconnex.com/index.php?id=96

Application

  • DI Water Rinse
  • Dry

Principle

  • Automated
  • Dry to Dry
  • Batch Spray System
]]> Spin Rinse Dryer 2008-10-01T13:54:26 Spray Ozone Tool http://www.siconnex.com/

  • Automated
  • Dry to Dry
  • Batch Spray System

Main Applications

  • Metal Etch
  • Oxide Etch
  • PDC (DHF, SC1, SC2)
  • Resist Strip
  • Freckle Etch

Process Example

  • (1) Load Wafer
  • (2) Al-Etch
  • (3) DIW Rinse
  • (4) Freckle Etch
  • (5) DIW Rinse
  • (6) Resist Strip
  • (7) DIW Rinse
  • (8) Dry Wafer

Advantages

  • Operator Safety
  • Closed automated System
  • Uniformities <3%
  • DIW Savings
  • End Point Detection
]]> Spray Ozone Tool 2008-10-01T13:34:14 DNS Track Systems http://www.siconnex.com/ Siconnex offers 3 types of lithography tools:
  • Coaters: coat wafers (i-line and DUV resist, PIQ, BCB, SOG, SOD)
  • Developers: develop exposed wafers
  • In-line Tools: coat/developer interfaced to stepper/scanner
]]> DNS Track Systems 2007-08-13T11:25:07