SINGLE WAFER SOLVENT PROCESSOR - LIFT OFF APPLICATION
The VERTICAL 200 SOLVENT is capable to handle all solvent and solvent based chemicals up to 95°C. 4 Chemical Process Chambers combine 2 steps in one Chamber: soaking and processing itself. This ensures dry Substrate handling. within the whole System. Separate Rinse/Dry Chambers are available for final cleaning. The VERTICAL 200 SOLVENT has a unique Substrate face down processing and closed Process Chamber design. This System can handle multiple Substrate Sizes without manual interruption.
ADVANTAGES
- Throughput >100 Wafers per hour
- Substrate Face Down Processing
- Soak and Lift Off in one Module
- Separate Rinse/Dry Module
- 1.65m x 2.5m Footprint
- Encapsulated System
- Dry Wafer Handling
- Closed Chambers
VERTICAL 200 SOLVENT APPLICATIONS
- METAL LIFT OFF
- POLYMER REMOVAL
- RESIST STRIP
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