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BATCHSPRAY Acid

The BATCHSPRAY Acid is capable to handle all acid and base materials up to 120°C. 4 Chemical Storage Tanks allow uninterrupted automated processes including Rinsing and Drying. An optical End-Point Detection System ensures the required Run-to-Run performance. With a capacity of 50 Wafers per run, the BATCHSPRAY Acid achieves a throughput of up to 120 Wafers per Hour.

ADVANTAGES

  • Automated dry in – dry out
  • 5 processes in one sequence
  • Repeatable process control
  • Footprint 1.2 m x 2 m
  • 80 % less DI water
  • 80 % less waste
  • Encapsulated system
  • Operator safe

 

APPLICATIONS

  • CLEAN
  • ETCH
  • RESIST STRIP

 

  

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