
| Process: - Automated
- Dry to Dry
- Batch Spray System
Main Applications - Positive Resist Strip
- Polymere Removal
- Negative Resist Strip
- Batch Develop
Advantages - Operator Safety
- Closed automated System
- Fresh and Used Process Chemicals
Process Example - (1) Load Wafer
- (2a) Strip (Solvent used)
- (2b) Strip (Solvent fresh)
- (3a) Clean (IPA used)
- (3b) Clean (IPA fresh)
- (4) DIW Rinse
- (5) Dry Wafer
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